首页> 外文会议>Nanostructured materials, thin films and hard coatings for advanced applications >Mathematical modelling the power supply-load system for electro-discharge polishing process
【24h】

Mathematical modelling the power supply-load system for electro-discharge polishing process

机译:放电抛光过程的电源-负载系统的数学建模

获取原文
获取原文并翻译 | 示例

摘要

The real electro-discharge polishing (EDP) system has been presented by an equivalent electrical scheme and described by a corresponded equation system. The Runge-Kutta-Merson method with automatically changed step is used for the numerical solution the equation system. The current through the resistor equivalent to the steam gas wrapper is defined with an I-V characteristic obtained by the method of multi-interval quadratic interpolation-approximation. A mathematical model of the power supply-load system has been realized in Basic and Matlab? languages. On the base of the developed modelling conditions limiting the current and voltage overload in the EDP system have been determined depending on the maximum polished area and the electrolyte temperature.
机译:实际的放电抛光(EDP)系统已通过等效的电气方案提出,并由相应的方程式系统进行了描述。具有自动更改步长的Runge-Kutta-Merson方法用于方程组的数值解。通过多间隔二次插值逼近法获得的I-V特性定义通过等效于蒸汽气体包裹器的电阻器的电流。在Basic和Matlab中已经实现了电源-负载系统的数学模型。语言。根据开发的建模条件,已根据最大抛光面积和电解液温度确定了限制EDP系统中电流和电压过载的条件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号