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MoS_2 thin films prepared by sulfurization

机译:硫化制备MoS_2薄膜

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摘要

Sulfurization of a Mo layer is one of the most used methods for preparation of thin MoS_2 films. In the method, a sulfur powder and Mo covered substrate are placed in different positions within a furnace, and heated separately. This requires a furnace having at least two zones. Here, we present a simplified version of the method where a one-zone tube furnace was used. A molybdenum film on a substrate and a sulfur powder were placed in the center of the furnace and heated at temperatures above 800℃. Mo films transform into MoS_2 in vapors of sulphur at high temperatures. As-prepared films were characterized by number of techniques including X-ray diffraction (XRD), atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman, Rutherford backscattering (RBS) and X-ray photoelectron spectroscopy (XPS). It appears that one-zone sulfurization, with just one annealing temperature used, is a suitable method for fabrication of MoS_2 thin films. This method is fast, cheap and easy to scale up.
机译:Mo层的硫化是制备MoS_2薄膜最常用的方法之一。在该方法中,将硫粉和覆盖有钼的衬底放置在炉内的不同位置,并分别加热。这需要具有至少两个区域的熔炉。在这里,我们介绍了使用单区管式炉的方法的简化版本。将衬底上的钼膜和硫粉放在炉子的中央,并在800℃以上的温度下加热。在高温下,Mo薄膜在硫蒸气中转化为MoS_2。制备的薄膜通过多种技术进行表征,包括X射线衍射(XRD),原子力显微镜(AFM),透射电子显微镜(TEM),拉曼,卢瑟福背散射(RBS)和X射线光电子能谱(XPS)。似乎仅使用一个退火温度的单区硫化是制备MoS_2薄膜的合适方法。该方法快速,廉价且易于扩展。

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