首页> 外文会议>Nanoengineering: Fabrication, Properties, Optics, and Devices IV; Proceedings of SPIE-The International Society for Optical Engineering; vol.6645 >Fabrication and Optical Characterization of Si_3N_4 2D-Photonic Crystals for Applications in Visible Range
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Fabrication and Optical Characterization of Si_3N_4 2D-Photonic Crystals for Applications in Visible Range

机译:Si_3N_4 2D光子晶体在可见范围内的制备和光学表征

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The paper presents our experimental results achieved on the field of investigation of LPCVD silicon nitride based two dimensional photonic crystals for visible wavelengths. Our research concentrates on the photonic band gap and defect engineering with respect to the use of silicon nitride based photonic crystals as optical resonators in the visible range of electromagnetic spectra. In order to optically characterize the fabricated photonic crystals, transmission setup utilizing broad band white light source is being used. Using this setup, photonic band gaps in the range between 500 and 900 nm, and thus covering the entire transmission range of LPCVD silicon nitride in the visible range, could be identified for various values of the slab thickness. By incorporating line defects, we fabricated and investigated several photonic crystal filter demonstrators. By optimizing the defect geometry, we achieved transmission values of over 85%.
机译:本文介绍了我们在基于LPCVD氮化硅的二维可见光波长二维光子晶体研究领域获得的实验结果。我们的研究集中在光子带隙和缺陷工程方面,这些问题涉及将氮化硅基光子晶体用作电磁波谱范围内的光学谐振器。为了光学表征所制造的光子晶体,正在使用利用宽带白光源的透射设置。使用这种设置,可以针对平板厚度的各种值确定500到900 nm之间的光子带隙,从而覆盖可见范围内LPCVD氮化硅的整个透射范围。通过合并线缺陷,我们制造并研究了多个光子晶体滤波器演示器。通过优化缺陷的几何形状,我们实现了超过85%的透射率值。

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