Effect of hydrogen plasma on chloride content in corroded copper samples

摘要

Artificially corroded copper samples were exposed to a hydrogen plasma for different time itervals. The plasma was generated by a high frequency discharge (RF) between two parallel opposite elelctrodes. After exosing the samples to the hydrogen plasma for a certain time, they were left in deionised water of 24 hours. The concentrations of chlorides released in water were then measured by an ion analyser. The amounts of chlorides in water are found to increase with longer plasma exposure time. From that, we deduce that, due to the effect of hydrogen plasma, the chlorides accumulated in the copper samples werfe transofmred to a more soluble form in water.