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Formation of New Nanostructures and Their Optical Properties under the Influence of High Pressure and Laser Irradiation

机译:高压和激光照射影响下新纳米结构及其光学性质

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The influence of pulsed laser radiation on the optical and structural properties of CNx:Н on glass substrates depending on the intensity of I laser pulses are investigated. The irradiation was carried out at the core frequency of Nd3+:YAG laser (λ = 1.064 μm, tp = 10 ns) in the modulated Q-mode. The start of structural changes CNx:Н under the pulsed laser radiation is determined by the indirect light detection spectroscopy. It is established that to anneal the films in an isopropanol solution takes much lower laser irradiation intensity than the one for films in the air. The possibility of reducing the amorphous phase and increasing the crystalline phase of CNx:H films with pulsed laser annealing is shown.
机译:研究了根据I激光脉冲强度对玻璃基板上CNX:的光学和结构特性对脉冲激光辐射的影响。在调制Q模式下,在ND3 +:YAG激光(λ=1.064μm,tp = 10ns)的核频率下进行辐射。结构改变的开始CNX:Н在脉冲激光辐射下由间接光检测光谱法决定。建立在异丙醇溶液中的薄膜退火的是,激光照射强度远低于空气中薄膜的薄膜。示出了减少无定形相和增加CNX:H膜与脉冲激光退火的晶相的可能性。

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