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Non-ablative removal of sub surface damages in ground optical glass substrates by controlled melting of thin surface layers using CO_2-laser radiation

机译:使用CO_2激光辐射控制薄表面层的薄表面层熔化来非烧蚀地面损伤的副表面损坏

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The form generation of optical surfaces by grinding and mechanical polishing results in small sub surface damages in the form of micro cracks which conventionally have to be removed by further removal of the damaged surface layers. In order to reduce process time and material cost non-ablative methods for removal of micro cracks are desired. Utilising the low optical penetration depths of less than 10 μm for CO_2-laser radiation in most optical glasses, the laser energy can be used to heat up and melt thin surface layers. Using a 1.5 kW CO_2-laser, a quasi-line focus formed by a scanner unit and a constant feed speed, it is possible to close all micro cracks present in the rough ground test surfaces (max. SSD-depth ~ 63 μm), while achieving a process time of less than 2 seconds for a O 30 mm N-BK7 lens, respectively 7.5 seconds for fused silica. With a Sa as low as 50 nm and low distortion from the original shape the surfaces can directly be conventionally polished, further reducing the process chain complexity.
机译:通过研磨和机械抛光形成光学表面的形成导致微裂缝形式的小亚表面损坏,其通常必须通过进一步除去损坏的表面层而被除去。为了减少处理时间和材料成本,需要进行除去微裂缝的非烧蚀方法。在大多数光学眼镜中利用对于CO_2激光辐射的低于10μm的低光学穿透深度,激光能量可用于加热和熔化薄的表面层。使用1.5千瓦CO_2激光,通过扫描仪单元形成的准线焦点和恒定的进给速度,可以关闭粗糙地测试表面中存在的所有微裂纹(最大SSD-Depth-63μm),在熔融二氧化硅的7.5秒分别实现7.5秒的7.5秒的处理时间,分别为o 30 mm n-bk7镜头。对于低至50nm的SA低至原始形状的低至50nm,表面可以直接抛光表面,进一步降低过程链复杂性。

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