PPPS-2013: Infrared gas phase studies and scaling parameters in PE-CVD processes at atmospheric pressure using high-current dielectric barrier discharges

摘要

Plasma-enhanced chemical vapour deposition (PE-CVD) of silica-like layers at atmospheric pressure onto large-area polymeric substrates has been shown to yield high-quality barrier layers. A key requirement is to achieve a diffusive discharge mode in industrially relevant air-like gas mixtures (N2/O2/Ar) without admixtures of Helium. An electronic stabilisation enables high discharge currents (several A) to be achieved.