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Effect of pulse energy and numbers on fused silica surface by ultraviolet laser pulses at 355nm in vacuum

机译:真空中355nm紫外激光脉冲能量和脉冲数对熔融石英表面的影响

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High-purity fused silica irradiated by UV laser in vacuum with different laser pulse parameters were studied experimentally. The defects induced by UV laser are investigated by UV absorption, fluorescence spectra and the structural modifications in the glass matrix are characterized by Raman spectra. Results show that, for laser fluence below the laser-induced damage threshold (LIDT), irradiation results in the formation of an absorption band and four defect-related fluorescence (FL) bands, and the intensities of absorption band and FL bands were increased with laser power and/or number of laser pulses. The optical properties of these point defects were discussed in detail. Analyzed these spectra, it indicates that the presence of different centers whose spectral features are modulated by structural disorder typical of the glass matrix.
机译:对真空紫外激光辐照高纯熔融石英进行了实验研究。用紫外吸收光谱、荧光光谱研究了紫外激光诱导的缺陷,用拉曼光谱表征了玻璃基体的结构修饰。结果表明,当激光能量密度低于激光诱导损伤阈值(LIDT)时,辐照会形成一个吸收带和四个缺陷相关荧光(FL)带,并且吸收带和FL带的强度随激光功率和/或激光脉冲数的增加而增加。详细讨论了这些点缺陷的光学性质。通过对这些光谱的分析,表明存在不同的中心,其光谱特征受到玻璃基质典型结构无序的调制。

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