The effect of RIE-modified surface contamination on optical performance of fused silica

摘要

A series of fused silica surface have been created by reaction ion etching to determine the effect of the contamination level on surface state and optical performance of the optics. The results show that both impurity elements contamination and scratches of fused silica surface can be removed dramatically during RIE process. The laser induced damage threshold is raised by 37.6% when the polishing layer is removed for a thickness of 6μm, and the laser weak absorption doesn't increase obviously. The results can provide technique support for improving laser induced damage performance of fused silica.