Local laser supported cleaning of microelectromechanical systems and components

摘要

The requirements for cleaning technology, e.g. local restrictability, ecological benefit and cleaning of even sub-urn particles, are risen up enormously in the last few years at the production of microelectromechanical systems and components. Most cleaning technologies are not able to meet all requirements, particularly local restrictability. Therefore a new cleaning technology, the Laser cleaning, has been introduced. Laser cleaning offers the possibility of local restrictability, high selectivity of the cleaning effect, application without chemicals and therefore high ecological benefit. It can be used for contaminations in form of films and particles. Moreover Laser cleaning is applicable to a wide range of materials and three-dimensional structures. Beside other cleaning technologies particularly Laser cleaning, carried out with Excimer and Nd-YAG Lasers, is employed at the Fraunhofer Institute for Manufacturing Engineering and Automation in Stuttgart. First results of Laser cleaning relating to different objects, contaminations and materials will be presented in this article.