首页> 外文会议>Conference on Frontier Academic Forum of Electrical Engineering >Influence of Slot Number on the Vacuum Arc Characteristics Between Spiral-Type Transverse Magnetic Field Contacts
【24h】

Influence of Slot Number on the Vacuum Arc Characteristics Between Spiral-Type Transverse Magnetic Field Contacts

机译:槽数对螺旋型横向磁场触头真空电弧特性的影响

获取原文

摘要

The transverse magnetic field (TMF) contacts can generate a transverse magnetic field driving the arc to rotate on the contact surface, which is beneficial to avoid severe ablation of contacts and improve the breaking performance. The contact structural parameters have an effect on the magnetic field distribution and vacuum arc characteristics. In this paper, the 3-D finite element models of spiral-type contacts with different number of slots were established, and the magnetic induction intensity distribution between contacts and the electromagnetic force of arc column were calculated. It was found that increasing the number of slots could effectively enlarge current density, and enhance the control of arc motion, but it would continually cause an arc motion to cross slots. Therefore, it was necessary to comprehensively consider the influence of the two aspects in the design of contact structure. The inductor-capacitor (LC) oscillation circuit was used to establish the experimental system. The vacuum arc appearances of 3-slot contacts and 4-slot contact were recorded by highspeed video camera, and the comparative analysis of vacuum arc and arc voltage characteristics were carried out. It could be observed that the 4-slot contacts had a higher concentration degree of arc column and a longer duration of arc voltage noise during the arc motion stage, in the meanwhile, the arc motion was more obvious.
机译:横向磁场(TMF)触头可以产生横向磁场,驱动电弧在触头表面旋转,有利于避免触头严重烧蚀,提高触头的分断性能。触头结构参数对磁场分布和真空电弧特性有影响。建立了不同槽数螺旋触头的三维有限元模型,计算了触头间的磁感应强度分布和弧柱的电磁力。研究发现,增加槽数可以有效地增大电流密度,加强对电弧运动的控制,但会持续导致电弧运动穿过槽。因此,有必要综合考虑这两个方面对接触结构设计的影响。采用电感电容(LC)振荡电路建立了实验系统。用高速摄像机记录了三槽触头和四槽触头的真空电弧形貌,并对真空电弧和电弧电压特性进行了对比分析。可以观察到,在电弧运动阶段,四槽触头的弧柱集中度较高,电弧电压噪声持续时间较长,同时电弧运动更加明显。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号