X-ray interferometry technique for thin-films study using a microfocus laboratory source

摘要

We are proposing an X-ray reflecto-interferometry technique using an x-ray microfocus laboratory source for thin-film structure research based on compound refractive lenses. The idea of this technique is to use a very simplified experimental setup where a focused X-ray beam reflected from parallel flat surfaces creates an interference pattern in a wide angular range. Due to this, the interference pattern can be obtained in a single shot without the need to rotate the specimen or the detector. The applicability of this technique has been demonstrated using the MetalJet Excillium microfocus laboratory source, which has GaKa emission line at 9.25 keV. A series of interference patterns for Si_3N_4 membranes and the experimentally obtained film thickness are in good agreement with the declared characteristics. The main advantages and future possible of the reflecto-interferometry technique are discussed.