Bloch-surface-waves based photonic devices studied by leakage radiation microscopy

摘要

The Bloch-surface-wave photonic devices were for the first time manufactured by the two-photon polymerization lithography. Bloch-surface-wave modes excitation and propagation were visualized by the leakage radiation microscopy. The mode structure of the guided light was characterized by the back-focal-plane imaging. It was demonstrated that the photonic devices are able to guide light in multimode regime.