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The Effect of Buffer Layer Location on LIGBT

机译:缓冲层位置对光的影响

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摘要

The N-buffer layer location of an N-LIGBT was adjusted, and the device characteristics were analyzed. The parameters of the device equivalent circuit were extracted to find the reason of the device improvement. Different parameter extraction methods were compared, it was found that the equipotential line method is the most accurate one.
机译:调节N-LIGBT的N-缓冲层位置,分析了器件特性。提取设备等效电路的参数以找到设备改进的原因。比较了不同的参数提取方法,发现等电位线方法是最准确的。

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