Growth of Rutile TiO_2 Nanorods by Chemical Bath Deposition Method on Silicon Substrate at Different Annealing Temperature

摘要

Effects of annealing treatment on growth of rutile TiO_2 nanorods on structural, morphological and optical properties of TiO_2 nanorods were investigated. The nanorods were fabricated on p-type (111)-oriented silicon substrates and, all substrates were seeded with a TiO_2 seed layer synthesized by radio-frequency reactive magnetron sputtering system. Chemical bath deposition (CBD) was carried out to grow rutile TiO_2 nanorods on Si substrate at different annealing temperatures (350, 550, 750, and 950°C). Raman spectroscopy, X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) analyses showed the tetragonal rutile structure of the synthesized TiO_2 nanorods. Optical properties were examined by photoluminescence spectroscopy. The spectra exhibit one strong UV emission peak which can be seen at around 390 nm for all of the samples. In the visible region, TiO_2 demonstrated two dominant PL emissions centered at around 519 and 705 nm. The experimental results showed that the TiO_2 nanorods annealed at 550°C exhibited the optimal structural properties. Moreover, the CBD method enabled the formation of photosensitive, high-quality rutile TiO_2 nanorods with few defects for future optoelectronic nanodevice applications.