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A new route for high quality nanometric films of inorganic halide perovskites

机译:无机卤化物钙锌矿高质量纳米膜的新途径

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Successful deposition of CsPbX_3 (X = Br, Cl) thin films (50-500 nm) on several kind of substrates has been realized by Radio-Frequency Magnetron Sputtering. The technique allows for high homogeneity of the samples on large areas (several cm2) not only in terms of morphology but also referring to the optical properties. In particular, high resolution (in space, spectrum and time) photoluminescence studies in a wide temperature range (10-300 K) reveal that the low inhomogeneous broadening comes from a submicron size disorder while no significant contribution arises from a micrometric or even larger disorder. Given the relevance of inorganic halide perovskites for innovative optoelectronic devices, our results prove the scalability of this technique. Moreover, the successful deposition on several different substrates open the route for an easy integration in multi-layered structures.
机译:通过射频磁控溅射已经实现了在几种基板上的CSPBX_3(X = BR,CL)薄膜(50-500nm)的成功沉积。该技术允许在大面积(几厘米)上的样品的高均匀性,不仅根据形态而且还指的光学性质。特别地,在宽温度范围(10-300k)中的高分辨率(空间,光谱和时间)光致发光研究表明,低的不均匀扩大来自亚微米大小紊乱,而没有显着的贡献来自微米或甚至更大的疾病。鉴于无机卤化物Perovskites对创新光电器件的相关性,我们的结果证明了这种技术的可扩展性。此外,在几种不同的基板上成功沉积打开了在多层结构中易于集成的途径。

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