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Advancements in Automated Mineralogy incorporating Micro-XRF technology

机译:掺入Micro-XRF技术的自动矿物学的进步

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Automated mineralogy has been successfully used in the mining industry since the 1970s. Since that time a variety of companies have developed competing technologies with a range of capabilities, however, with one common aspect in that they are all based on an electron beam (e-beam) system (e.g. scanning electron microscope (SEM) with energy dispersive spectrometers (EDS)). Recent technological advancements mean it is now possible to focus X-rays to a small spot size using a polycapillary lens. Accordingly, a micro-XRF system can be operated using similar parameters as an e-beam system and thus yield results compatable with traditional automated mineralogical analysis. To confirm the micro-XRF's capabilities a variety of case studies are presented, including samples from exotic-Cu deposits in Chile, epithermal Au-Ag deposits in New Zealand, diamond deposits in South Africa, and REE deposits in Chile. The micro-XRF systems have a distinct advantage over e-beam based systems in that the sample preparation is simpler and that larger samples can be analysed. In addition, the x-ray source yields a spectral excitation with significantly lower limits of detection. However, e-beam based systems are able to obtain a smaller beam size. As with traditional automated mineralogical systems, there are fundamental parameters that impact on the mineralogical classification and analytical time; this includes (but is not limited too) x-ray beam excitation (kV and uA), detector active areas (mm~2), pixel spacing (urn), and dwell time (ms).
机译:自20世纪70年代以来,自动化矿物学已成功地在矿业行业中使用。从那时起,各种公司已经开发了具有一系列能力的竞争技术,但是,一个共同的方面,因为它们都基于电子束(电子束)系统(例如,扫描电子显微镜(SEM)具有能量分散的光谱仪(EDS))。最近的技术进步意味着现在可以使用多百张透镜将X射线聚焦到小点尺寸。因此,可以使用与电子束系统类似的参数操作微XRF系统,因此可以与传统的自动化矿物学分析相容的产量结果。为了确认微XRF的能力,提出了各种案例研究,包括来自智利外来铜矿的样品,新西兰的膜状Au-Ag矿床,南非的金刚石沉积物,以及智利的REE存款。微XRF系统在基于电子束的系统上具有明显的优点,因为样品制备更简单并且可以分析更大的样品。另外,X射线源产生光谱激发,具有显着降低的检测限。然而,基于电子束的系统能够获得较小的光束尺寸。与传统的自动化矿物学系统一样,存在对矿物学分类和分析时间影响的基本参数;这包括(但不限于此)X射线束激励(KV和UA),检测器有源区域(MM〜2),像素间隔(URN)和停留时间(MS)。

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