Nickel Nanoparticle Size and Morfology as a Key to Control the Particle Photoluminescence and Photochemistry

摘要

Behavior of NO molecules adsorbed on the surface of Ni overlayer deposited on the aluminium oxide film induced by ultraviolet photons generated by nanosecondpulsed laser at low fluence (3 mJ/cm2) has been investigated by reflection-absorption infrared spectroscopy (RAIRS) and time-of-flight (TOF) measurements. It is found that in adsorption of NO on Ni/Al2O3 at very low Ni coverage (0.04 ML), when the film can be viewed as consisting of separated single adsorbed atoms or very small clusters, the photon irradiation leads to NO desorption. Photodesorption is an essentially non-thermal process, since the mean translational temperature of the desorbing molecules (1100 K) is much higher than the substrate temperature, even with the account of the transient temperature jump caused by the photon crystal.