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The Study on Subsurface Damage Depth and Morphology of Optical Material

机译:光学材料地下损伤深度和形态研究

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The paper is mainly to research the subsurface damage depth and morphology on grinding and polishing substrates on optical materials, and analyze different subsurface damage morphologies caused by different processing technologies. The best etching solution is selected by experiments, grinding and polishing substrates are etched for proper time by divided stages. Use 120 × optical microscope and scanning electronic microscope to observe subsurface damage morphology and Taylor Hobson PGI1240 to measure the etching depth to obtain the subsurface damage depth.
机译:本文主要是在光学材料上研究研磨和抛光基板上的地下损伤深度和形态,并分析由不同加工技术引起的不同地下损伤形态。通过实验选择最佳蚀刻溶液,通过分割阶段蚀刻研磨和抛光基板。使用120×光学显微镜和扫描电子显微镜观察地下损伤形态和泰勒波尔逊PGI1240测量蚀刻深度,以获得地下损伤深度。

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