Intermediate phases and their thickness in Fe-Fe50wt%Si diffusion couples were studied. Diffusion couples were annealed at 1050°C and 1150°C with / without magnetic field. Microstructures of diffusion couples were analyzed using scanning electron microscopy (SEM), electron backscatter diffraction (BSE) and energy dispersive spectroscopy (EDS). From the results, we know that two silicide phases (Fe_2Si, Fe_3Si) were only found after short-time heating whether the samples were treated with or without magnetic field. Silicide phases of Fe_2Si and Fe_3Si disappeared when samples heated for longer time. Meanwhile, the thickness of FeSi layer heated under magnetic field was smaller than those without magnetic field at the same temperature and diffusion time, and the growth of FeSi phase obeys the parabolic rate law.
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