High-Speed Thick Oxide Coatings by Laser-assisted Chemical Vapor Deposition

摘要

Thick coating process should be developed for many applications of oxidation protection, abrasives and thermal barrier coatings (TBC). Chemical vapor deposition (CVD) can provide high quality coatings; however, the deposition rate of CVD can be generally too small to obtain thick coatings. We have developed a new laser CVD (LCVD) achieving high deposition rates for wide-area substrates using Nd:YAG laser. This LCVD technique is applicable for many oxide coatings by changing precursor materials. Yttria-stabilized zirconia (YSZ) films containing a large amount of nano-pores were obtained at 660 mu mh~(-1), which could be applicable to TBC being almost comparable to EB-PVD (electron-beam physical vapor deposition). TiO_2 films were prepared at tremendously high speed around 2300 mu mh~(-1). Y_2O_3 films exhibited excellent anti-plasma corrosion performance as high as that of single crystalline Y_2O_3.