Hard X-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy

摘要

X-ray focusing techniques using Kirkpatrick and Baez mirrors are promising due to their capability of highly efficient and energy-tunable focusing. We have been developing a hard-X-ray focusing system using K-B mirrors for an X-ray microscope. Here, we report the development of a mirror manipulator and focusing tests using the manipulator. Mirror alignment tolerances were estimated using two types of simulators: a ray-trace simulator and a wave-optical simulator. On the basis of the simulation results, the mirror manipulator was developed achieving optimum K-B mirrors setup. The focal size was achieved to be 48 x 36nm~2 (V x H) in FWHM at 1km long beamline of SPring-8. The obtained spatial resolution test results indicate that a scanning microscope with the focused beam can resolve the line-and-space patterns of 80nm line width in a high visibility of 60%.