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Quantifying dimensional accuracy of a Mask Projection Micro Stereolithography System

机译:量化屏蔽投影微立体刻度系统的尺寸精度

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Mask Projection Microstereolithography is capable for fabricating true three-dimensional microparts and hence, holds promise as a potential micro-fabrication process for micro-machine components. In this paper, the Mask Projection Micro-Stereolithography (MPμSLA) system developed at the Rapid Prototyping and Manufacturing Institute at Georgia Institute of Technology is presented. The dimensional accuracy of the system is improved by reducing its process planning errors. To this effect, the MPμSLA process is mathematically modeled. In this paper, the irradiance received by the resin surface is modeled as a function of the imaging system parameters and the pattern displayed on the dynamic mask. The resin used in the system is characterized to experimentally determine its working curve. This work enables us to compute the dimensions of a single layer cured using our system. The analytical model is validated by curing test layers on the system. The model computes layer dimensions within 5% error.
机译:掩模投影微管状光刻能够制造真正的三维微粉,因此,保持作为微机器部件的潜在微制造过程的承担。在本文中,介绍了在佐治亚理工学院的快速原型制造和制造研究所开发的掩模投影微立体刻度法(MPμSLA)系统。通过降低其过程规划错误来提高系统的尺寸精度。为此,MPμSLA过程在数学上建模。在本文中,树脂表面接收的辐照度被建模为成像系统参数的函数和动态掩模上显示的图案。系统中使用的树脂的特征在于实验确定其工作曲线。这项工作使我们能够计算使用我们的系统固化的单层的尺寸。通过固化系统上的测试层验证分析模型。该模型计算5%错误范围内的层尺寸。

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