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Excimer ablation of ITO on flexible substrates for large format display applications

机译:用于大型格式显示应用的柔性基板上的ITO准分子消融

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Excimer-based ablative patterning of Indium Tin Oxide (ITO) thin film on flexible substrates has been evaluated for large format display applications. In display package manufacturing, excimer-based ITO ablation can provide a great advantage over conventional photolithographic processing. It can eliminate many steps from the manufacturing cycle, resulting in significant cost reduction. Flexible substrate display packaging is desirable for at least two reasons. It allows roll-to-roll low cost, large volume manufacturing. Its low weight procides for an easy scale up to larger format displays. A XeCl excimer, 1x, amplitude mask pattern projection, scan-and-repeat system was utilized in the evaluation work. The mask pattern had line groupings of line-widths varying from 8 to 30 μm with line length of 44 mm. Lines from all the groupings were simultaneously ablated in 150 nm-thick ITO layer on a flexible 100 μm thick Polyethylene trephtalate (PET) substrate using scanning with optimized dwell duration of 10 pulses and optimized fluence level of 350 mJ/cm~2. Lines ablated with mask line groupings of line-width greater than or equal to 11 μm showed complete electrical isolation indicating complete ITO removal. Scanning Electron Microscopy (SEM) showed the presence of a slight curling effect at ablated line edges. The effect was studied as a function of wavelength and imaging resolution. A CO_2 snow cleaning method was evaluated for removing the extruding curled material.
机译:基于准分子的氧化铟锡(ITO)薄膜在柔性基板上的薄膜的闪烁图案化已经评估了大型格式显示应用。在显示封装制造中,基于准分子的ITO消融可以在传统的光刻处理中提供很大的优势。它可以消除制造周期的许多步骤,从而减少了显着的成本。由于至少有两个原因,柔性基板显示器是期望的。它允许卷滚低成本,大批量生产。其低重量的探测器,可轻松扩展到更大的格式显示。在评估工作中使用了XECL准分子,1X,幅度掩模图案投影,扫描和重复系统。掩模图案具有线宽的线分组,线宽从8到30μm,线长度为44mm。通过扫描在柔性100μm厚的聚乙烯Trephitalate(PET)基板上同时在150nm厚的ITO层中同时烧蚀于150nm厚的ITO层,其优化的停留持续时间为10个脉冲,并且优化的流量水平为350 mJ / cm〜2。与大于或等于11μm大于或等于11μm的线宽的掩模线分组的线显示出完全电隔离,表明完整的ITO去除。扫描电子显微镜(SEM)显示在烧蚀线边缘处存在轻微的卷曲效果。研究了效果作为波长和成像分辨率的函数。评价CO_2雪清洁方法以除去挤出卷曲材料。

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