Scatter Analysis for Particle Contamination of a Bi-Symmetric Reflective System

摘要

We demonstrate a step-by-step procedure of conducting a straylight scatter analysis due to particle contamination study using ASAP ( Advanced System Analysis Program), a versatile, time-tested commercial software for modeling in optical and illumination systems, including wave effects, diffractive and scattering phenomenon. We hope to demonstrate that scalar optical modeling technology is mature and is highly suitable for commercial applications that are beginning to show higher demands in Signal-to-Noise ratios. Other systems that can be modeled include photonic fiber coupling systems, liquid crystal display technology, MEMS devices, as well as high intensity arc sources.