首页> 外文会议>International Symposia on Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II, and Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing >Probing the adsorption of fluorine on aluminum (111) surfaces by low-energy ion scattering and density functional calculations
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Probing the adsorption of fluorine on aluminum (111) surfaces by low-energy ion scattering and density functional calculations

机译:低能离子散射和密度函数计算探测氟对铝(111)表面的吸附

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Low-energy ion scattering (LEIS) measurements were performed to probe the adsorption of fluorine to the aluminum (111) surface. When well-ordered surfaces were exposed to fluorine using a XeF_2 source, LEIS signals characteristic of surface ordering disappear, indicating that fluorine covers the surface in a disordered fashion. At submonolayer coverages, a slight enhancement along the [211] direction is observed, suggesting that sites with 3-fold symmetry may be energeticaly somewhat more stable than the on-top sites. These observations are supported by density functional calculations for a 7-layer periodic-slab structure. The calculations indicate that the binding energies of fluorine to the three different sites are very similar. Although the on-top site is found to be the least stable, its energy is predicted to lie only ~ 3.5 kcal mol~(-1) above the fcc site (predicted to be the lowest-energy site). The Al-F binding energy to the on-top site is predicted to be 107 kcal mol~(-1), which is considerably smaller than the Al-F dissociation energy in gas-phase AlF_3.
机译:进行低能量离子散射(沥青)测量以探讨氟对铝(111)表面的吸附。当使用XEF_2源暴露氟的氟化良好的表面时,光信号表面排序的特性消失,表明氟以无序的方式覆盖表面。在亚底覆盖范围内,观察到沿着[211]方向的略微增强,表明具有3倍对称性的位点可能比顶部位点更稳定的能量。这些观察结果通过密度函数计算支持7层周期板结构。计算表明氟对三种不同位点的结合能量非常相似。虽然发现顶端位点是最不稳定的,但其能量预计仅在FCC网站上方仅〜3.5千卡〜(-1)(预计是最低能量位点)。将Al-F将能量与顶部位点预测为107千卡Mol〜(-1),其比气相ALF_3中的Al-F离解能大得多。

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