【24h】

Gas phase analysis of TiCl{sub}4 and NH{sub}3 plasma processes by molecular beam mass spectrometry

机译:TiC1 {Sub} 4和NH {Sub} 3等离子体过程的气相分析通过分子束质谱法

获取原文

摘要

Molecular beam mass spectrometry (MBMS) has been used to analyze the gas phase of Ar, Ar+TiCl{sub}4 and NH{sub}3 plasmas. The gas phase composition was analyzed as a function of pressure and plasma power. The results show that an increase in plasma power increases the concentration of dissociated and ionized species in the plasma phase. Higher plasma power increased the intensity of ions from TiCl{sub}4 and Ar up until 100 W and then ion intensity starts to level off with increasing rf power to case of NH{sub}3 plasma, N{sup}+ ion intensity increased until 20 W plasma power reaching a plateau. The Ar ion intensity increases with total reactor pressure up to 26.66 Pa (200 mTorr) and then ion intensity was found to decrease with pressure. The ion intensity of NH{sub}3 plasma increased with total reactor pressure until 66.65 Pa (500 mTorr).
机译:分子束质谱(MBMS)已用于分析Ar的气相,Ar + TiCl {Sub} 4和NH {Sub} 3等离子体。分析气相组合物作为压力和等离子体功率的函数。结果表明,等离子体功率的增加会增加血浆相中解离和电离物质的浓度。较高的等离子体功率增加了来自TiC1 {Sub} 4的离子强度,并达到100W,然后离子强度随着NH {Sub} 3等离子体的增加而增加,NH {sub} 3等离子体的情况增加直到20瓦的等离子体电力到达高原。 Ar离子强度随着总反应器压力的增加而增加,高达26.66Pa(200毫托),然后发现离子强度随压力降低。 NH {Sub} 3等离子体的离子强度随着总反应器压力的增加,直至66.65Pa(500 mtorr)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号