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High photorefractive sensitivity in the visible and at 860 nm in reduced iron and rhodium-doped KNbO/sub 3/

机译：在可见光和860nm中，在还原的铁和铑掺杂的KNO / sub 3中的高光折敏感性高/

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《Summaries of Papers Presented at the Conference on Lasers and Electro-Optics》|2001年||共1页
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Ewart M.; Ryf R.; Institute of Electric and Electronic Engineer;
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中图分类自动化技术、计算机技术;
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1. High photorefractive sensitivity at 860 nm in reduced rhodium-doped KNbO3 [J] . Ewart M, Ryf R, Medrano C, Optics Letters . 1997,第11期

机译：还原铑掺杂的KNbO3在860 nm处具有高光折变敏感性
2. Enhanced wave mixing in photorefractive rhodium-doped barium titanate crystals [J] . A. Petris, M.J. Damzen, V.I. Vlad Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter . 2000,第1a3期

机译：光折射铑掺杂钛酸钡晶体中的增强波混合
3. EXPERIMENTAL INVESTIGATIONS OF THE PHOTOREFRACTIVE PROPERTIES OF RHODIUM-DOPED BATIO3 AT 1.06 MU-M [J] . Brignon A., Huignard JP., Garrett MH., Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter . 1997,第4a6期

机译：1.06 MU-M掺杂铑的三溴甲烷的光折变特性的实验研究
4. High photorefractive sensitivity in the visible and at 860 nm in reduced iron and rhodium-doped KNbO/sub 3/ [C] . Ewart, M., Ryf, . 2001

机译：还原的铁和铑掺杂的KNbO / sub 3 /在可见光和860 nm处具有高光折变敏感性
5. Visible and near infrared sensitive photorefractive polymers for holographic display applications. [D] . Eralp, Muhsin. 2007

机译：适用于全息显示应用的可见光和近红外光致折光聚合物。
6. Reduced Transverse Relaxation Rate (RR2) for Improved Sensitivity in Monitoring Myocardial Iron in Thalassemia [O] . Jerry S. Cheung, Wing-Yan Au, Shau-Yin Ha, -1

机译：降低横向松弛率（RR2）以改善敏感性的敏感性在地中海贫血中的心肌铁
7. Order-of-magnitude reduction of the photorefractive response time in rhodium-doped Sr0.6Ba0.4Nb2O6 with a dc electric field [O] . Sayano Koichi, Yariv Amnon, Neurgaonkar Ratnakar R. 1990

机译：直流电场在掺铑Sr0.6Ba0.4Nb2O6中光折变响应时间的数量级减少
8. Simultaneous Exposure Using 532 and 860 nm Lasers for Visible Lesion Thresholds in the Rhesus Retina [R] . 2005

机译：使用532和860 nm激光同时曝光睫毛视网膜可见病变阈值

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