首页> 外文会议>Society of Photo-Optical Instrumentation Engineers Conference on Organic Photorefractives, Photoreceptors, and Nanocomposites >Photorefractive properties of TNFM-sensitized PVK-based polymer composites and fully functionalized polymethacrylates
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Photorefractive properties of TNFM-sensitized PVK-based polymer composites and fully functionalized polymethacrylates

机译:TNFM敏化的PVK基聚合物复合材料的光折雾性能和全官能化的聚甲基丙烯酸酯

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We have studied the photorefractive properties of (2, 4, 7-trinitro-9-fluorenylidene) malononitrile (TNFM) sensitized poly(N-vinylcarbazole)/N-ethylcarbazole polymer composites doped with 2-(3, 5, 5-trimethylhex-2-ene-1-ylidene)-1, 3-propanedinitrile and related dyes. Characterization included four-wave mixing experiments, two-beam coupling and photoconductivity measurements at a wavelength of 780 nm. At an applied field of 53 V/umm, we have observed complete internal diffraction and at 68 V/umm a gain coefficient of 230 cm~-1. Small alterations in the chromophore donor group substituents were used to tune the ionization potential of the dopant dye by 0.3 eV. They affected the grating build-up time, photorefractive phase shift, and complexatio with TNFM. This performance is compared to that of three newly synthesized polymethacrylates functionalized with carbazole, a dodecyl chain as an internal plasticizer and three different dyes. Here we observe net two-beam coupling gain and a diffraction efficiency of 60
机译:研究了(2,4,7-三腈-9-芴基)丙二腈(TNFM)敏化的聚(n-乙烯基咔唑)/ N-乙基咔唑聚合物复合材料的光焦褶皱性质,掺杂有2-(3,5,5-三甲基己酰基 - 2-eNE-1- ylidene)-1,3-丙亚硝基腈和相关染料。表征包括四波混合实验,双梁耦合和光电导率测量以780nm的波长。在53 v / umm的施加领域,我们观察到完全内部衍射和68 V / UMM的增益系数为230cm〜-1。通过0.3eV调节发色团供体组取代基的微小改变将掺杂剂染料的电离电位调谐。它们影响了光栅积累时间,光折隙相移和TNFM的复杂性。将该性能与三种新合成的聚甲基丙烯酸酯相比,用咔唑,十二烷基链作为内部增塑剂和三种不同的染料。在这里,我们观察净双光束耦合增益和60的衍射效率

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