首页> 外文会议>ASME International Mechanical Engineering Congress and Exposition >EFFECT OF ALTERING THE SEQUENCE OF CHEMPOLISHING AND ELECTROPOLISHING ON SURFACE PROPERTIES OF ADDITIVELY MANUFACTURED (AM) 316 STEEL COMPONENTS
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EFFECT OF ALTERING THE SEQUENCE OF CHEMPOLISHING AND ELECTROPOLISHING ON SURFACE PROPERTIES OF ADDITIVELY MANUFACTURED (AM) 316 STEEL COMPONENTS

机译:改变化学镀锌序列和电抛光级序列的效果(AM)316钢组分表面性质

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The surface roughness of as produced additively manufactured (AM) components is verv high and may lead to component failure and undesirable coefficients of friction. In rough surfaces, small cracks form at regions of high surface roughness acting as a stress raiser or crack nucleation sites. Likewise, rough surfaces impact both static and kinetic friction that can impede desired motion and oppose desired mechanical forces. For using these components in many applications, it is necessary to reduce surface deviations drastically during postprocessing. For parts with complex geometries and enormous internal surface areas, this reduction presents a complex engineering problem. We have explored chempolishing (C) and electropolishing (E) to reduce the external and internal surface roughness of stainless-steel components in our previous studies. Chempolishing is an electroless etching process that can uniformly smoolhen the accessible surfaces of complex AM components. Electropolishing can produce an extremely smooth surface to sub-micrometer level roughness. Our prior work showed that chempolishing and electropolishing produced very distinct surface microstructures. It is quite possible that in future surface finishing, chempolishing and electropolishing may be applied on the same AM component to reduce the surface roughness of complex AM components. The resulting microstructure after the sequential application of chempolishing and electropolishing may be quite different as compared to that of after chempolishing or electropolishing alone. Here, we report the application of altering the sequence of chempolishing and electropolishing to reduce the external and internal surface roughness of 316 steel components. It is unknown what will be the impact of manipulating the sequence of electropolishing and chemical polishing on surface roughness and microstructure of AM materials. This paper focuses on the post-process sequencing of chempolishing, followed by electropolishing (CE) and vice versa (EC). We found chempolishing followed by electropolishing reduced internal surface roughness by as much as 12 micrometers. Whereas the electropolishing followed by chempolishing reduced external surface roughness by an average of ~15 micrometers. The structure and properties of the surface finished pieces were examined using: Scanning Electron Microscopy (SEM), Surface Profilometry and Water Contact Angle Measurement. SEM provided direct insight that CE and EC process produced significantly different microstructures from each other and also from chempolished and electropolished processes. Water contact angle measurements performed on CE, and EC treated AM samples showed that surface energy was quite different. Hence, CE and EC are expected to perform quite differently under a corrosive environment and also yield various adhesion quality for the protective coatings. Confirmation of structural changes provided in this experiment shed light on the capabilities of postprocessing improvements we can make to materials performance.
机译:添加的制备的(AM)组分的表面粗糙度是verv高的,并且可能导致组分破坏和不希望的摩擦系数。在粗糙的表面中,在高表面粗糙度区域的小裂缝形式作用作为应力升降机或裂纹成核位点。同样,粗糙表面会影响静态和动力学摩擦,这可以阻碍所需的运动并反对所需的机械力。对于在许多应用程序中使用这些组件,有必要在后处理期间大大降低表面偏差。对于具有复杂几何形状和巨大的内表面区域的部件,这种减少呈现了复杂的工程问题。我们探索了化学釜(C)和电解槽(E),以降低我们以前的研究中不锈钢组件的外表和内表面粗糙度。 Chempolishing是一种无电性蚀刻工艺,可以均匀地单叶上的复杂AM组件的可接近表面。电抛光可以产生极光滑的表面到亚微米级粗糙度。我们的现有工作表明,Chempolishing和电抛光产生了非常明显的表面微观结构。在将来的表面精加工中,可以在相同的AM组分上施加化学抛光和电沸功,以降低复合AM组分的表面粗糙度。与单独的化学镀锌或电抛光之后,化学镀锌和电沸化的顺序施加后的所得微观结构可能是完全不同的。在这里,我们报告了改变化学镀温和电解槽序列的应用,以降低316个钢组分的外部和内表面粗糙度。不知道如何操纵电力抛光和化学抛光序列对AM材料的表面粗糙度和微观结构的影响。本文重点介绍化学抛光后的过程后测序,然后电力抛光(CE),反之亦然(EC)。我们发现Chempolishing,然后通过电力挖掘出降低的内表面粗糙度,多达12微米。而电抛光抛光,然后化学挖掘出外表表面粗糙度,平均为15μm。使用:扫描电子显微镜(SEM),表面轮廓测定法和水接触角测量来检查表面成品的结构和性质。 SEM提供了直接见解,即CE和EC工艺彼此产生显着不同的微观结构,也是来自化学良好的和电解研的过程。在CE和EC治疗的AM样品上进行的水接触角测量表明,表面能相当不同。因此,预计CE和EC预计在腐蚀性环境下表现得非常不同,并且还为保护涂层产生各种粘附质量。确认本实验中提供的结构变化揭示了后处理改进的能力,我们可以对材料性能进行材料。

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