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Microfocusing 4-keV to 65-keV xrays with bent Kirkpatrick-Baez mirrors

机译:用弯曲的Kirkpatrick-Baez镜子将微焦4-kev至65 kev XRAYS微焦

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We present the test results of micro-focusing a continuous spectrum (4 KeV - 65 keV) of x rays using two, 100 mm long, actively bent mirrors in a Kirkpatrick-Baez geometry. The mirrors are figured by applying in situ two different moments on the ends resulting in a surface figure that approximates an ellipse. We have demonstrated the ability to doubly focus NSLS bending magnet x rays from 4 KeV to 13 KeV to a spot size less than 4 microns in diameter with a net gain of 2000 over a similar size beam produced with slits. In the bending magnet test the beam was focused in the vertical direction with a high quality rhodium coated Si mirror with a rms surface roughness and slope error less than 2 angstrom and 2 $mu@rad, respectively. The horizontal mirror consisted of uncoated float glass with significantly greater roughness and slope error. This combination of mirrors worked extremely well, pointing the direction for inexpensive micro-focusing optics. Vertical focusing tests were also performed using only the high quality Si mirror. On the bending magnet, x rays were focused to 30 KeV using an incidence angle of 2 mrad achieving a best focus of 2.5 microns FWHM, resulting in a net gain of 91. Additional high energy focusing tests were carried out at the NSLS superconducting wiggler beamline X17. In this case a continuous x-ray spectrum was vertically focused using the Si mirror with an energy cutoff of 65 KeV (at an incident angle of 1 mrad) achieving a focal spot size of 3.3 microns FWHM and a net gain of 20.
机译:我们提出的试验结果微聚焦连续光谱(4千电子伏 - 65千电子伏)使用两个,100mm长,积极地弯曲的反射镜在一个帕特里克-贝兹几何X射线的。反射镜通过原位施加于导致近似于椭圆形的表面图中的端部的两个不同的时刻想通。我们已经证明了从4千电子伏至13千电子伏弯曲磁体X射线的光斑大小的直径小于4微米与2000年的在具有狭缝产生了相似的大小束的净增益的能力双重焦点NSLS。在弯曲磁铁试验的光束聚焦在垂直方向上与涂覆的Si反射镜具有均方根高质量铑表面粗糙度和斜率误差小于2埃和2 $亩@弧度,分别。水平反射镜由未涂覆的浮法玻璃与显著更大的粗糙度和斜率误差。反射镜的这种组合的工作非常出色,指点廉价微聚焦光学器件的方向。垂直方向的聚焦测试仅使用高品质的Si反射镜也进行。在弯曲磁体,X射线被聚焦至30千电子伏,使用2毫弧度的入射角实现的2.5微米FWHM最佳聚焦,导致91.其他高能量聚焦测试的净增益在NSLS超导摆动器束线进行了X17。在这种情况下的连续的X射线光谱,垂直聚焦使用硅镜65千电子伏的能量截止(在1毫弧度的入射角)实现的3.3微米FWHM焦斑大小和20的净增益。

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