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The influence of preparation conditions on the visible photoluminescence band in porous silicon

机译:多孔硅中可见光致发光带对可见光致发光带的影响

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A separation of the broad visible band of the photoluminescence into two subbands with maxima situated at 1.54 eV and 1.72 eV at room temperature and related to preparation conditions was observed in porous silicon films on (100) p-type wafers. The subbands at 1.72 eV and 1.54 eV were explained by the surface states and quantum size effect models, respectively.
机译:将光致发光的宽可见条带分离成两个子带位于1.54eV和1.72eV在室温下,在(100)p型晶片上的多孔硅膜中观察到与制备条件相关的1.72eV。表面状态和量子尺寸效果模型分别解释了1.72eV和1.54eV的子带。

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