Surface properties of holograms studied by atomic force microscopy

摘要

The surface conditions of holographic materials were studied with atomic force microscopy (AFM). Holograms were made using Agfa 8E75 plates with two different types of developer and bleaching methods for the purpose of obtaining holograms of high diffraction efficiency. Developers and bleaches were based on Pyrogallol and Kodak D-19, and on potassium dichromate and potassium iodide, respectively. The observation area ranged from hundreds of nm to tens of microns and z (depth) from a few nm to hundreds of nm in ordinary circumstances. The AFM images of the relief pattern of holograms and the size and shapes of silver halide grains after bleaching were obtained in ambient air without coating.