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A Study of Mechanical and Water Vapor barrier Performances for Flexible organic Solar Cells Protecting Coating

机译:柔性有机太阳能电池保护涂层机械和水蒸气屏障性能研究

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The combination of a hard and brittle silica-like layer (SiO_x) with a soft organosilicon layer (SiO_xC_yH_z) depositing on PET substrate by PECVD and initiated-PECVD respectively, leads to a good protective coating for OPV modules. While the inorganic layer exhibits barrier properties, the organic layer enables a reduction of the defects in the upper inorganic layer as well as an enhancement of the mechanical properties of the stack barrier. A 100-nm-thick silica-like layer shows fracture flexibility at relatively small radius of curvature about 5.5 mm under tension and about 2 mm under compression. The critical tension bending fracture value was further decreased to less than 1.5 mm by reducing layer thickness to 30 nm. Flexibility failure of the 100-nm-thick silica-like layer placed under tension was enhanced when deposited over the smooth and soft organosilicon layer. In that case, the critical bending radius of this layer was about 4 mm instead of 5.5 mm. Besides, tensile fragmentation test revealed high coating cohesion and adhesion related to high coating durability. SiO_xC_yH_z/SiO_x dyad exhibited a transparency of about 92-93% in the wavelength range of 400-800 nm which fulfills the transmittance requirement for an OPV module. Regarding barrier performance, the WVTR of a single silica-like layer deposition decreases from in the range 0.1 to 0.02 g/m~2/day 1 at 25°C and 85% RH when the thickness increases from 50 to 100 nm. WVTR of 0.02 g/m~2/day 1 was also obtained by depositing only 20 nm thick SiO_x layer over a 1μm-thick SiO_xC_yH_z layers, which improved barrier mechanical properties.
机译:通过PECVD和引发PECVD分别在PEC底物上沉积的软有机硅层(SiO_xC_yH_Z)的硬质和脆性二氧化硅层(SiO_x)的组合,导致OPV模块的良好保护涂层。虽然无机层表现出阻隔性质,但有机层使得能够减少上无机层中的缺陷以及堆叠屏障的机械性能的增强。 100nm厚的二氧化硅样层显示在张力下约5.5mm的相对较小的曲率半径下的断裂柔韧性,并在压缩下约2mm。通过将层厚度降低至30nm,临界张力弯曲断裂值进一步降低至小于1.5mm。当沉积在光滑和软有机硅层上时,增强了在张力下放置的100nm厚的二氧化硅层的灵活性。在这种情况下,该层的临界弯曲半径为约4mm而不是5.5mm。此外,拉伸碎裂试验显示出与高涂层耐久性有关的高涂层内聚力和粘合性。 SIO_XC_YH_Z / SIO_X DYAD在400-800nm的波长范围内呈现约92-93%,满足OPV模块的透射率要求。关于阻隔性能,当厚度从50至100nm增加时,单个二氧化硅样层沉积的WVTR从0.1至0.02g / m〜2 /天1的范围内减小。通过在1μm厚的SiO_XC_YH_Z层上沉积仅20nm厚的SiO_x层,还可以通过仅沉积20nm厚的SiO_xc_yh_z层来获得0.02g / m〜2 / dia 1的WVTR,这改善了阻挡机械性能。

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