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Effect of annealing temperature on the optical and structural properties of As_(40)Se_(50)Ge_(10) thin films

机译:退火温度对As_40)Se_50)Ge_10薄膜光学和结构性能的影响

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The present paper reports the decrease and increase of optical band gap from the pristine value upon annealing at below and above glass transition temperature of the sample. The thin films of As_(40)Se_(50)Ge_(10) with 800nm thickness were annealed at 140°C and 180°C. The structural characterization was done by X-ray diffraction and Raman spectroscopy. The optical transmission data was recorded by UV-Visible spectrometer in the wavelength range of 400-1100 nm. The indirect optical bandgap was found to decrease and again increased with change in annealing temperature. The films remain in amorphous state irrespective of the optical change and Raman shift. The surface morphology and composition of the film was checked in FESEM study.
机译:本文报道了在低于和高于玻璃化转变温度的样品退火后,光学禁带从原始值减少和增加。将厚度为800nm的As_40;40)Se_50)Ge_10薄膜在140°C和180°C下退火。通过X射线衍射和拉曼光谱进行结构表征。在400-1100 nm波长范围内,用紫外可见光谱仪记录光传输数据。间接光学带隙随着退火温度的变化而减小,然后又增大。无论光学变化和拉曼位移如何,薄膜都保持非晶态。在FESEM研究中检查了薄膜的表面形态和成分。

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