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Self-Leveling 2D DPN Probe Arrays

机译:自平整2D DPN探测阵列

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摘要

Dip Pen Nanolithography (DPN) is a direct write scanning probe-based technique which operates under ambient conditions, making it suitable to deposit a wide range of biological and inorganic materials. Precision nanoscale deposition is a fundamental requirement to advance nanoscale technology in commercial applications, and tailoring chemical composition and surface structure on the sub-100 nm scale benefits researchers in areas ranging from cell adhesion to cell-signaling and biomimetic membranes. These capabilities naturally suggest a "Desktop Nanofab" concept — a turnkey system that allows a non-expert user to rapidly create high resolution, scalable nanostructures drawing upon well-characterized ink and substrate pairings. In turn, this system is fundamentally supported by a portfolio of MEMS devices tailored for microfluidic ink delivery, directed placement of nanoscale materials, and cm2 tip arrays for high-throughput nanofabrication. Massively parallel two-dimensional nanopatterning is now commercially available via NanoInk's 2D nano PrintArray~(TM), making DPN a high-throughput (>3x10~7 μm~2 per hour), flexible and versatile method for precision nanoscale pattern formation. However, cm2 arrays of nanoscopic tips introduce the nontrivial problem of getting them all evenly touching the surface to ensure homogeneous deposition; this requires extremely precise leveling of the array. Herein, we describe how we have made the process simple by way of a self-leveling gimbal attachment, coupled with semi-automated software leveling routines which bring the cm^2 chip to within 0.002 degrees of co-planarity. This excellent co-planarity yields highly homogeneous features across a square centimeter, with <6% feature size standard deviation. We have engineered the devices to be easy to use, wire-free, and fully integrated with both of our patterning tools: the DPN 5000, and the NLP 2000.
机译:Dip Pen纳米光刻(DPN)是一种直接写入扫描探针的技术,可在环境条件下运行,适用于沉积各种生物和无机材料。精密纳米级沉积是在商业应用中推导纳米级技术的基本要求,以及剪裁化学成分和表面结构,对来自细胞粘附到细胞信号传导和仿生膜的区域中的研究人员。这些功能自然地建议了一个“桌面纳米纸”概念 - 一种交钥匙系统,允许非专家用户快速创建高分辨率,在特征良好地的墨水和基板配对上绘制高分辨率可伸缩的纳米结构。反过来,该系统基本上由用于微流体墨水输送的MEMS器件的组合,导向纳米级材料的置换和用于高通量纳米制作的CM2尖端阵列。大规模平行的二维纳米透视图现在可通过纳米南部的2D纳米Printarray〜(TM)可商购,使DPN成为高通量(> 3x10〜7μm〜2,每小时),精密纳米级图案形成的灵活和多功能的方法。然而,CM2纳米镜头阵列介绍了使它们均匀接触表面以确保均相沉积的非竞争问题;这需要阵列的极其精确的平整。在此,我们描述了我们如何通过自平整的万向节附件简单地实现过程,其与半自动软件调平程序耦合,使CM ^ 2芯片在0.002度的共平坦度内。这种优异的共平平坦性在平方厘米上产生高度均匀的特征,具有<6%的特征尺寸标准偏差。我们设计了设备易于使用,无线,并完全与我们的图案化工具:DPN 5000和NLP 2000完全集成。

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