Synthesis and Characterization of Novel HABI as Photoinitiators for Dry Film Resist

摘要

A novel HABI (hexaarylbiimidazole) derivative containing eight hydroxy groups was synthesized from the starting material, 3,3'-dimethoxybenzoin via a serial reactions including oxidation, hydrolyzation, introduction of epoxy groups, ring-opening reaction by acetic acid, formation of imidazole structure and coupling reaction. All products were characterized by NMR and API-ES MS to confirm their successful synthesis.