A novel positive-tone and aqueous-base-developable photosensitive benzocyclobutene-based material for microelectronics

摘要

This work describes a positive-tone and aqueous-base-developable benzocyclobutene (BCB)-based dielectric material. The polymer is made from divinylsiloxane bis(benzocyclobutene) and BCB-acrylic acid. A diazonap-thoquinone in the formulation makes it photosensitive. Patterned films have high resolution, and via openings are scum-free without a de-scum operation. The material possesses optical, electrical, thermal, and mechanical properties desirable for many microelectronic applications, including as a planarization layer or an insulation layer in display, and in packaging.