AFM Evaluation of Silver Halide Material for Holography

摘要

To record high-resolution holograms successfully, it is necessary to minimize scattering in the recording material. This scattering, in silver halide materials, is caused by initial and final (i.e. after processing) grain-size distributions and by the thickness as well as by the index of refraction variations of the recording medium. Using atomic force microscopy (AFM) we investigated surface topography of representative silver halide holographic recording material. We have applied the trypsin treatment, which was usually used to enhance a surface relief holographic recording, to eliminate the superficial cover layer of gelatine and to render underneath buried grain-size investigation possible. The average grain-size was measured before and after trypsin treatment and the results were compared with Electron-Microscopy measurements. Local hardness of samples under the influence of standard as well as of the surface relief sensitive processing is measured as well.