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MECHANICAL BEHAVIORS OF NANOIMPRINTED CU-NI ALLOYS USING MOLECULAR DYNAMICS SIMULATION

机译:用分子动力学模拟纳米压印Cu-Ni合金的机械行为

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Molecular dynamics (MD) simulation with a tight-binding potential is used to studied the mechanical behaviors of nanoimprinted Cu-Ni alloys before and after annealing. The annealing process consists of three different stages. Initially, there is a gradual heating from the original temperature of 300 K to the specified annealing temperature of 823 K and then it is followed by a period of constant heating at that temperature, after which the specimen temperature is allowed to cool gradually to the original temperature. The results showed that when the punch is advancing, the punching force obtained from the simulation with a tight-binding potential is lower than with the Morse potential. The internal energy of Cu-Ni alloys decreased with increasing the temperature and the component of Cu during the annealing process. In addition, comparing the residual stress in the Cu-Ni alloys with and without annealing treatment, the stress is significantly released after annealing.
机译:具有紧密结合电位的分子动力学(MD)模拟用于在退火之前和之后研究纳米印刷Cu-Ni合金的机械行为。退火过程包括三个不同的阶段。最初,从原始温度为300k的逐渐加热至823k的指定退火温度,然后在该温度下进行一段恒定的加热,之后将样品温度逐渐冷却到原始温度。结果表明,当冲头前进时,从绑定电位的模拟中获得的冲击力低于摩尔斯势。 Cu-Ni合金的内部能量随着在退火过程中的温度和Cu的温度和组分增加而降低。另外,将Cu-Ni合金中的残余应力与且不退火处理进行比较,退火后显着释放应力。

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