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Performance of the Magnetron H~- Source on the BNL 200 MeV Linac

机译:磁控管H〜 - BNL 200 MEV LINAC的源头的性能

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A magnetron surface plasma H~- ion source has been used at Brookhaven since 1982 for injection into the 200 MeV linac. Since 1989, this source has operated with a circular aperture, injecting into an RFQ. The source typically produces 90-100 mA of H~- at 35 keV, in 700 μs pulses at up to 10 Hz. The arc parameters are ~15 A, 150 V, and the extracted e/H- ratio is 1/2. Ions are extracted from a 2.8 mm diameter aperture (J = 1.6 A/cm~2). The emittance is approximately ε_(n,ms) = 0.4 π mm mrad. The performance is very reliable, operating continuously for ~6 months, with essentially no parameter adjustments required once the source is stabilized.
机译:自1982年以来,Brookhaven以自1982年注射了200MeV Linac,磁控表面等离子体H〜离子源。自1989年以来,该源采用圆形光圈运行,注入RFQ。该来源通常在35keV中产生90-100mA,在700μs脉冲中,高达10 Hz。电弧参数是〜15a,150v,提取的E / h比为1/2。离子从直径为2.8mm直径的孔径(J = 1.6a / cm〜2)中提取。发射率约为ε_(n,ms)=0.4πmmmrad。性能非常可靠,连续运行〜6个月,一旦源稳定,就必须无需参数调整。

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