PREPARING ULTRA FINE HMX PARTICLES BY GAS PROCESS

摘要

In the paper, ultra-fine HMX was prepared by GAS process under different conditions. Acetone was used as solvent. Carbon dioxide was used as anti-solvent for the recrystallization process. The different particle size and crystal shape of HMX were obstained by changing the pressure and its rising rate. The ultra-fine HMX particle (< 1μm) can be produced at 8.0MPa, and three crystal shape were obstained at the different rate of pressure rise.