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Silicon carbide coated MEMS strain sensor for harsh environment applications

机译:用于苛刻环境应用的碳化硅涂层MEMS应变传感器

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We present poly-SiC coating and subsequent operation of a Si-based double-ended tuning fork (DETF) resonant strain sensor fabricated in the Bosch commercial foundry process. The coating is applied post release and, hence, has minimal impact on the front end of the microfabrication process. The deposition thickness of nanometer-thin SiC coating was optimized to provide enhanced corrosion resistance to silicon MEMS without compromising the electrical and mechanical performance of the original device. The coated DETF achieves a strain resolution of 0.2 µЄ in a 10 Hz to 20 kHz bandwidth, which is comparable to the uncoated device. The coated DETF is locally heated with an IR lamp and is shown to operate up to 190 °C in air with a temperature sensitivity of −7.6 Hz/°C. The devices are also dipped in KOH at 80 °C for 5 minutes without etching the structures, confirming the poly-SiC coating provides a sufficient chemical barrier to the underlying silicon. The results demonstrate that SiC-coated poly-Si devices are an effective bridge between poly-Si and full poly-SiC films for applications requiring a high level of corrosion resistance and moderate operating temperatures (up to 200 °C) without compromising the performance characteristics of the original poly-Si device.
机译:我们呈现聚光涂层和随后的博世商业铸造工艺中制造的Si的双端调谐叉(DETF)谐振菌传感器的操作。涂层被施加后释放,因此对微制造过程的前端具有最小的影响。优化纳米薄SiC涂层的沉积厚度,以提供对硅MEM的增强耐腐蚀性,而不会影响原始装置的电气和机械性能。涂覆的DEDF在10Hz至20kHz带宽中实现0.2μL的应变分辨率,其与未涂覆的装置相当。涂覆的DEDF用IR灯本地加热,并且显示在空气中可在温度敏感度为-7.6Hz /℃的空气中操作。该器件在80℃下也将在KOH中浸渍5分钟,而不蚀刻结构,确认聚-SIC涂层为下面的硅提供足够的化学屏障。结果表明,SiC涂覆的多Si器件是多Si和全多晶硅膜之间的有效桥,用于需要高水平的耐腐蚀性和中等工作温度(最高200°C)而不损害性能特征的应用原始多Si器件。

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