Ion induced luminescence was studied for SiO_2 glasses and SiO_2 based optical fiber materials with different hydrogen and oxyhydrate concentration. The luminescence of the visible wavelengths was measured during the irradiation of protons and also heavier ions with low (5～10 keV) and high (0.2 ～ 2 MeV) energies, at a temperature range between 295 and 600 K. Hydrogen concentration profiles were also examined by the ion beam analysis techniques to compare the nominal OH values. In addition to a prominent broad peak of 460 nm, characteristic peaks were detected at around 390 nm and 660 nm, depending on the OH contents. For fused silica specimens with lower OH, however, a peak at 390 nm was found at a small dose and its intensity decreased quickly with an increase of the ion dose. For synthesized silica with higher OH concentration, a small peak was found at 650 nm, corresponding to the non-bonding-oxygen-hole-center, while the 390 nm peak not appeared. Except for the low-OH synthesized silica, there existed a large amount of hydrogen, which does not form OH. The origin of the luminescence and the damage process will be discussed in connection with the nuclear and electronic energy loss by the penetrating energetic ions.
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