In-situ optical measurements of transmittance, and reflectance by ellipsometry on glass, strips and webs in large area coating plants

摘要

Optical coatings for large area applications are provided by high performance PVD technologies. Both the techniques reactive Electron Beam (EB) Evaporation and reactive Dual Magnetron Sputtering are applied for high rate depositon of optical multilayers. The challenges of such optical oxide coationgs are to provide excellent uniformity over the substrate width of several meters with high productivity. For these kinds of production plants, special tailored EB evaporation equipment and large Dual magnetron sputter sources are advantageously implemented. Not only does reactive revaporation or sputtering have to be considered to maintain precise deposition of optical multilayers on continuously moving substrates, but the beneficial adaptation of different in situ measurement techniques play a vital role and are indispensable to control such long term processes.