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Deposition of hard highly transparent abrasion-resistant DLC on glass

机译:在玻璃上沉积硬质高透明耐磨性DLC

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The interest towards Diamond-Like Carbon (DLC) coatings has increased in recent years, due to its high-performance properties, which include low friction, high hardness, resistance to abrasion and an excellent transparency. One of the main substrate of interest is glass. Currently DLC deposition on glass relies on Plasma-Assisted Chemical Vapour Deposition (PACVD) methods equipped with ion guns, since non-electrically conductive substrates have difficulty in achieving good hard carbon coating deposition with high adhesion strength by any other method. These ion sources require very frequent maintenance. The Physical Vapour Deposition (PVD) of sp3 hybridised carbon via magnetron sputtering of carbon targets presents clear advantages in terms of process cleanliness in comparison with PACVD methods, but it also comes with inherent challenges. In particular, an enhancement of the substrate-plasma interaction, namely in the level of ion bombardment during deposition, needs to be ensured. In magnetron sputtering, approximately 5% of the gaseous species are ionised, thus several methods are used to increase ionic availability. In this paper the authors address new methodologies for hard abrasion-resistance DLC deposited on glass. These methods have been demonstrated in different deposition systems from R&D to industrial scale, for applications from small to large area touch screens, smart displays and ultimately large architectural glass, sectors where highly transparent scratch resistance coatings are required.
机译:由于其高性能特性,近年来对钻石状碳(DLC)涂层的兴趣增加,包括低摩擦,高硬度,耐磨损性和优异的透明度。其中一个主要的感兴趣的底物是玻璃。目前DLC沉积在玻璃上依赖于配备有离子枪的等离子体辅助化学气相沉积(PAPVD)方法,因为非导电基材难以通过任何其他方法实现具有高粘合强度的良好的硬碳涂层沉积。这些离子源需要非常频繁的维护。通过磁控溅射的SP3杂交碳的物理气相沉积(PVD)通过碳靶的磁控溅射在与PACVD方法相比的过程清洁方面具有明显的优点,但它也具有固有的挑战。特别地,需要确保在沉积期间的离子轰击水平中提高基板 - 等离子体相互作用。在磁控溅射中,约5%的气态物质被电离,因此使用几种方法来提高离子可用性。在本文中,作者地址沉积在玻璃上的硬耐磨DLC的新方法。这些方法已在从研发到工业规模的不同沉积系统中证明,对于小到大面积触摸屏,智能显示器和最终大型建筑玻璃,需要高度透明的耐刮擦涂层的扇区。

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