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A new silicon blue / UV selective stripe-shaped photodiode

机译:一种新的硅蓝/紫外线选择性条纹光电二极管

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A new silicon stripe-shaped photodiode for the selective detection of blue / UV light was realized in standard industrial 0.5μm CMOS technology, with a simple post-processing step. The selectivity is achieved using a shallow active region,limited by a high potential barrier at a depth of 450 nm. A stripe-shaped structure is used to minimize the dead layer area and thus enhance the UV sensitivity. The peak wavelength is at 440 nm. A ratio of the responsivities at 440 nm and 1μm better than 60 was achieved. An increase of the UV responsivity using our stripe-shaped photodiode by a factor 1.7 is predicted and demonstrated. This structure can be used in applications where low-cost blue / UV selective photodetectors are needed.
机译:在标准工业0.5μmCMOS技术中实现了一种用于选择性检测蓝/紫外光的新硅条状光电二极管,具有简单的后处理步骤。使用浅有源区实现选择性,限制在450nm深度的高潜在屏障。条形结构用于最小化死层区域,从而提高UV敏感性。峰值波长为440nm。实现了440nm和1μm的响应的比率优于60。预测和演示使用我们条纹的光电二极管通过尺寸1.7增加UV响应度的增加。这种结构可用于需要低成本蓝/ UV选择性光电探测器的应用中。

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