Intense pulsed heavy ion beam is expected to be applied to materials processing including surface modification and ion implantation. For those applications, it is very important to generate high-purity ion beams with various ion species. A magnetically insulated ion diode with an active ion source of a vacuum arc plasma gun has been developed in order to generate pulsed metallic ion beams. When the ion diode was operated at diode voltage ≈200 kV, diode current ≈15 kA and pulse duration ≈100 ns, the ion beam with an ion current density of > 200 A/cm~2 was obtained at 50 mm downstream from the anode. From Thomson parabola spectrometer measurement, the ion beam consists of aluminum ions (Al~+, Al~(2+) and Al~(3+)) of energy 60-300 keV and the proton impurities of energy 60-150 keV. The purity of the beam was estimated to be 89%.
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