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Proximity coupling in high T_c josephson junctions produced by focused electron beam irradiation

机译:通过聚焦电子束照射产生的高T_C Josephson结中的接近耦合

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Using the particular benefits of Focused Electron Beam Irradiation (FEBI) junctions, such as on chip modification of the barrier resistivity through controlled variation of the electron fluence and annealing, we show that the conventional model for SNS junctions as derived by De Gennes can explain the their behavior in great detail. Due to the high defect concentration produced by the electron beam, the barrier material is non-superconducting and has a much higher normal state resistivity than undamaged YBa_2Cu_3O_(7-#delta#). From the exponential scaling of the critical current (I_c) with the square root of the resistance (R_n) it is shown that FEBI junctions have a dirty limit SNS character and that the carrier mass in the irradiated material is of the order of m_e.
机译:利用聚焦电子束照射(FEBI)结的特殊益处,例如通过对电子流量和退火的控制变化的阻挡电阻率的芯片改变,我们表明De Gennes衍生的SNS结的传统模型可以解释他们的行为非常细节。由于电子束产生的高缺陷浓度,阻挡材料是非超导,并且具有比未造成的YBA_2CU_3O_(7-#delta#)更高的正常状态电阻率。从临界电流(I_C)的指数缩放与电阻(R_N)的平方根,表明FEBI结具有脏极限SNS特征,并且辐照材料中的载体质量是M_E的顺序。

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