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Linear model application for the design of transparent conductive In/sub 2/O/sub 3/ electrodes

机译:线性模型应用于/亚2 / o / sub 3 /电极透明导电设计

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Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In this paper we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a mathematical linear model to control the processing stages of these films production is presented. This linear model is based on a mathematical approach which optimize the processing procedure parameters to yield the best coating performance. The main idea in this linear model optimization procedure lies in finding functions extremums using their derivatives and gradients. The Transparent Conductive Oxide (TCO) Indium Oxide thin films (In/sub 2/O/sub 3/) were obtained by DC magnetron sputtering from pure Indium Oxide target in an argon atmosphere. The obtained transparent conducting thin films had the following parameters: -Transparency in 550 nm wavelength-90.7% (including the glass substrate with an absolute transparency of 91.08%); -resistivity of 0.043 /spl Omega//spl middot/cm for a 2525 /spl Aring/ film. As a result of this work the linear model was found to be a useful instrument for the general fabrication design of thin film systems.
机译:近年来,具有高导电性和最大光学透明性的透明导电涂层吸引了很多关注。发布的大部分作品,直到该领域的出现集中在薄膜涂层的物理分析和设计中。在本文中,我们提出了一种不同的方法来制造透明导电薄膜的制造设计。提出了一种用于控制这些薄膜生产的处理阶段的数学线性模型而不是分析最终产品的复杂物理模型。该线性模型基于数学方法,该方法优化处理过程参数以产生最佳涂层性能。这种线性模型优化过程中的主要思想在于使用其衍生物和梯度找到极值的功能。通过在氩气氛中,通过从纯氧化铟靶从纯氧化铟滴溅射获得透明导电氧化物(TCO)氧化铟薄膜(In / Sub 2 / o / Sub 3 /)。所得透明的导电薄膜具有以下参数:在550nm波长-90.7%(包括绝对透明度为91.08%的玻璃基板)中的翻转; -2525 / SPL浇筑/薄膜的0.043 / SPL OMEGA / CM的0.043 / SPLω/ cm。由于这项工作,发现线性模型是薄膜系统的一般制造设计的有用仪器。

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